--《》年论文

【摘要】：正 Chemical vapor deposition(CVD)has been widely studied for depositing TiO2 thin films on thesupports with various geometric shapes.Plasma CVD(PCVD)has been known to activate the depositionprocess more effectively than that of thermally driven CVD,because it makes USe of low temperature。non-thermal equilibrium plasmas that provide energetic species to activate reactant molecules attemperature compatible with a wide range of substrate materials.However,PCVD have been studied in the

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